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Process Applications:
- SiO2, undoped
- Diffusion barrier or insulating layer for silicon wafers or soda-lime sheet glass
- SiO2, boron or phosphorous doped (BSG or PSG)
- TiO2:
- Antireflective layer for silicon solar cells
APCVD Advantages
The 5500 Series APCVD conveyor furnace is well suited for continuous high volume processing of substrates requiring single as well as multi-layer thin films. SierraTherm's in-line system design assures that each substrate receives the same process treatment. Distinctly unlike other furnaces, the SierraTherm 5500 Series is an energy efficient precision thermal processing system which provides unequaled performance:
- Maintenance conscious design allows chemical injectors and exhaust ducting to be cleaned while in place on the system
- Multiple injector heads can be used in series within a single furnace, maximizing process throughput, uniformity, and flexibility while minimizing cost.
- Modular chemical vapor injector head assemblies allow quick and easy installation and removal from the coating chamber
- Location and design of stainless steel bubbler systems maximize control and serviceability
- All injector head parts are durable precision machined structures ensuring
- accurate chemical delivery even after extended use
- Pump-based, bi-directional bulk refill system provides continuous chemical refill without process interruption or manual transfer
- Continuous self-cleaning mechanisms in critical exhaust restrictions prevent flow altering residue build-up
- Automatic process exhaust and precursor flow control guarantee consistent film results
- Three tiers of graded, power saving insulation reduce energy bills
- Stable, unsurpassed temperature uniformity control ensures consistent process results